The leader in In-situ and In-line monitoring of semiconductor processes for more than 20 years

WetSpec200: Wet Process Concentration Analyzer

Multi Channel Concentration Analyzer

CI-SEMI’s in-line, multi-channel wet process analysis system, WetSpec 200 enables non-contact real-time monitoring and closed-loop control of chemical composition in wet process applications.

The WetSpec200 is ideal for monitoring, cleaning and etching chemistries. Based on CI-SEMI’s novel chemo-metric methodology, the WetSpec200 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and waste involved.

The system’s versatile SW models enable soft-switch between different chemistries. With the capability to monitor up to eight flow cells in parallel, the WetSpec200 provides an efficient, low cost per channel process monitoring.

When integrated into a control system, the WetSpec200 enables tighter process control and identifies process excursions before they affect yield. 

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Features & BenefitsTypical applications
  • In-line, real-time monitoring and characterization of chemical composition of liquids
  • No need for chemical sampling or dilution
  • Short measurement time and low operational costs
  • One analyzer can monitor several measuring cells with different chemistries
  • Analysis of complex (multi-component) chemistries
  • Real-time measurement enables closed loop control
  • Up to 200 meters distance between analyzer and measuring cell enables placement of analyzer in a convenient location

Application

Component

Range, wt%

SC1

NH4OH

0 – 6

H2O2

0 – 10

SC2

HCl
H2O2

0-4 wt%
0-8 wt%

DSP (Dilute Sulfuric Peroxide)

H2SO4

8 – 13

H2O2

2 – 5

HF/HCl

HF

0-20

HCI

0 – 1.2

HF

HF

0 – 20

Phosphoric

 H3PO4

 80-90

SPM 

 

 H2SO4

 70-90

 H2O2

 0-10

Hydrofluoric Peroxide

HF

22 – 27

H2O2

13 – 17

Buffered Oxide Etch

HF

1 – 5

NH4F

16 – 24

Nitric/Acetic Acid

HNO3

1 – 4

CH3COOH

8 – 12

ACT 970

Water

14 – 19

EKC265

Water

16 – 28

ST-26S

Water

5 – 20

ST-250

Water

34 – 38

Peroxide in CMP Slurry

H2O2

0 – 5

Ammonium Hydroxide

NH4OH

0 – 5

Citric Acid

Citric Acid

0 – 1.5

(*)  Other chemistries supported per request 

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